Clustertool for Ion Beam Etching of 300mm wafers
- Buyer
- Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V.
- Published
- February 19, 2026
Description
The tender item is an ion beam etching process tool to be used for 300mm wafer fabrication at the FRAUNHOFER IPMS. The systems will be used for the processing of CMOS wafers in a cleanroom class 1000 (approximately class 6 EN ISO 14644-1) production environment. Therefore, it is necessary to fulfill require-ments regarding metal contamination and particle generation compatible with industry standards.
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