Two-photon 3D lithography printing system FIRST-CLA at ETH Zurich

Description

The FIRST-CLA platform of ETH Zurich invites bids for the purchase of a two-photon three-dimensional (3D) micro- and nanolithography system. The instrument will be used for: 1) 3D printing of submicron and micron sized features with nanometer-resolution and nanometer surface roughness 2) 3D printing of structures in the order of submilimeter to several millimetres in XYZ with shell/scaffolding and freely moving parts. System must allow the user to switch between different configurations (high-est resolution, lower resolution but faster). 3) 3D printing on different substrates such as wafers, chips, and fibers of opaque and transparent nature without pretreatment. For further information please refer to the tender documents.