Clustertool for Ion Beam Etching of 300mm wafers

Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V.Germany

Purchaser

Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V.

Country

Germany

Published

19 Feb 2026

Closing date

Not listed

Source ID

Docs found

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Tender summary

The tender item is an ion beam etching process tool to be used for 300mm wafer fabrication at the FRAUNHOFER IPMS. The systems will be used for the processing of CMOS wafers in a cleanroom class 1000 (approximately class 6 EN ISO 14644-1) production environment. Therefore, it is necessary to fulfill require-ments regarding metal contamination and particle generation compatible with industry standards.

What to check before bidding

Issued by Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V..
Located in Germany.
No closing date is listed yet.
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